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Development of a Resin-Coated Micro Polishing Tool by Plasma CVD Method: Electrorheological fluid-assisted polishing of Tungsten carbide micro aspherical molding dies

机译:等离子CVD方法的树脂涂层微抛光工具的开发:碳化钨微非球面成型模具的电流变流体辅助抛光

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摘要

The viscosity of an electrorheological fluid (ER fluid) increases with an increase in the intensity of an electric field. In the case of ER fluid-assisted micro polishing the workpiece needs to be a conductive material such as tungsten carbide and the gap between the workpiece and the polishing tool, which both act as electrodes, must be the same size as the abrasive grain. It is difficult to maintain a small gap when polishing the surface of the workpiece. In order to prevent direct contact between the workpiece and the polishing tool, a resin-coated polishing tool has been developed. In this paper, a micro polishing tool was made using a plasma chemical vapor deposition method. The geometry of the polishing tool was examined by a finite element method (FEM) to optimize the concentration of the abrasive grains. In polishing machining using the tool, the width of the polishing groove was 35 μm, and polishing machining in a micro area was achieved.
机译:电流变流体(ER流体)的粘度随着电场强度的增加而增加。在ER流体辅助微抛光的情况下,工件必须是导电材料,例如碳化钨,并且工件和抛光工具之间的间隙(两者均用作电极)必须与磨粒具有相同的尺寸。抛光工件表面时,很难保持很小的间隙。为了防止工件和抛光工具之间的直接接触,已经开发了涂覆树脂的抛光工具。在本文中,使用等离子体化学气相沉积法制造了微抛光工具。抛光工具的几何形状通过有限元方法(FEM)进行了检查,以优化磨粒的浓度。在使用该工具的抛光加工中,抛光槽的宽度为35μm,并且实现了微小区域的抛光加工。

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