Structure of low temperature nitrided/oxidized layer formed on NiTi shape memory alloy

摘要

Structure of the nitride-oxide surface layers, formed using glow discharge technique at low temperature (between 200 and 380°C) changing the parameters of the process, was examined applying X-ray diffraction as well as transmission electron microscopy. The phase analysis was supported by results obtained from XPS measurement. Obtained results have shown that low temperature nitriding/oxiding produced the thin layers (18 ÷ 30 nm in thickness), which consist of titanium nitride and oxide phase. Low amount of the nickel-titanium oxide was also identified in the layer produced at higher temperature. Decrease of nitriding/oxidizing temperature below 300°C cause that between nitride-oxide surface layer and NiTi alloy did not create the intermediate layer of Ni_3Ti phase. The results were verified and confirmed by observation carried out using high resolution electron microscopy. The corrosion properties of such coatings were tested in the physiological Tyrod's solution using the cyclic potentiodynamic polarization method.