Magnetic properties of amorphous hydrogenated carbon thin films doped by Ni

摘要

Amorphous hydrogenated carbon thin films were deposited on Si and glassceramics substrates by reactive ion-plasma magnetron sputtering. Thin films were without (a-C:H) and with Ni nanoparticles (a-C:H:Ni). Measurement of absorption coefficient in 220-850 nm spectral range using spectrophotometer and following approximation applying of Tauc method shows that obtained a-C:H thin films material has near 3.6 eV optical band gap and confirmed that this material is amorphous semiconductor. Thin films with Ni nanoparticles have a high complex permittivity ε* and permeability μ*(ε' ≈ 1000-10000, ε" ≈ 100-1500, μ' ≈10-70, μ"≈ 0.4-10）. Some magnetic parameters of thin films were determined.