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Electronic and bonding properties of Fe- and Ni based hydrogenated amorphous carbon thin films by X-ray absorption, valence-band photoemission and Raman spectroscopy

机译:铁和镍基氢化非晶碳薄膜的X射线吸收,价带光发射和拉曼光谱法的电子和键合性能

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Electronic and bonding properties of Me-based hydrogenated amorphous carbon (a-CH:Me, Me = Fe, Ni) thin films have been studied by X-ray absorption near-edge structure (XANES), valence-band photoemission (VBPES) and Raman spectroscopy. Raman and XANES results show enhancement of the content of sp~3-rich diamond-like carbon (DLC) by doping with Fe and Ni. The VB-PES spectrum of a-CH:Fe shows emergence of a prominent feature due to states of sp~3-bonded clusters, indicating that a-CH:Fe induced enhancement of DLC structure. The nano-indentation measurement reveals that a-CH:Fe has a greatly enhanced hardness, while electrical resistance measurement shows that a-CH:Me reduces resistivity.
机译:通过X射线吸收近边缘结构(XANES),价带光发射(VBPES)和X射线吸收光谱研究了Me基氢化非晶碳(a-CH:Me,Me = Fe,Ni)薄膜的电子和键合性能。拉曼光谱。拉曼和XANES结果表明,掺杂Fe和Ni可提高富含sp〜3的类金刚石碳(DLC)的含量。 a-CH:Fe的VB-PES光谱由于sp〜3键簇的状态而显示出突出的特征,表明a-CH:Fe诱导了DLC结构的增强。纳米压痕测量表明,a-CH:Fe的硬度大大提高,而电阻测量表明,a-CH:Me降低了电阻率。

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