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首页> 外文期刊>Journal of Experimental and Theoretical Physics >Influence of the Si(111)-7 × 7 surface reconstruction on the diffusion of strontium atoms
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Influence of the Si(111)-7 × 7 surface reconstruction on the diffusion of strontium atoms

机译:Si(111)-7×7表面重建对锶原子扩散的影响

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The diffusion of strontium atoms on the Si(111) surface at room temperature has been investigated using scanning tunnel microscopy and simulation carried out in terms of the density functional theory and the Monte Carlo method. It has been found that the reconstruction of a clean silicon surface with a 7 × 7 structure has a profound effect on the diffusion process. The average velocity of motion of a strontium atom in a unit cell of the 7 × 7 structure has been calculated. The main diffusion paths of a strontium atom and the corresponding activation energies have been determined. It has been demonstrated that the formation of scanning tunnel microscope images of the Si(111)-7 × 7 surface with adsorbed strontium atoms is significantly affected by the shift of the electron density from the strontium atom to the nearest neighbor silicon adatoms in the 7 × 7 structure.
机译:锶原子在室温下在Si(111)表面的扩散已使用扫描隧道显微镜进行了研究,并根据密度泛函理论和蒙特卡洛方法进行了模拟。已经发现,具有7×7结构的干净的硅表面的重构对扩散过程具有深远的影响。计算出7×7结构的晶胞中锶原子的平均运动速度。已经确定了锶原子的主要扩散路径和相应的活化能。已经证明,吸附锶原子的Si(111)-7×7表面的扫描隧道显微镜图像的形成受电子密度从锶原子向7中最邻近的硅原子迁移的影响显着。 ×7结构。

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