Low-Complexity Full-Melt Laser-Anneal Process for Fabrication of Low-Leakage Implanted Ultrashallow Junctions

摘要

Good-quality ultrashallow n~(+)p junctions are formed using 5-keV amorphizing As~(+) implantations followed by a single-shot excimer laser anneal for dopant activation. By using an implant that is self-aligned to the contact windows etched in an oxide isolation layer, straightforward processing of the diodes is achieved with postimplantation processing temperatures kept below 400 deg C. A possible source of junction leakage at the perimeter caused by dip-etch enlargement of the contact window, also confirmed by transmission electron microscopy (TEM) analysis, is identified, and diode performance is improved by increasing the junction/contact window overlap. The optimum performance in terms of low leakage, shallow junctions, and low resistivity is achieved for 30 deg tilted implants and by applying a thin laser-reflective aluminum layer. This work isolates the minimum requirements for achieving low-leakage diode characteristics.