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首页> 外文期刊>Journal of Electronic Materials >Characterization by Internal Photoemission Spectroscopy of Single-Crystal CVD Diamond Schottky Barrier Diodes
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Characterization by Internal Photoemission Spectroscopy of Single-Crystal CVD Diamond Schottky Barrier Diodes

机译:单晶CVD金刚石肖特基势垒二极管的内部光发射光谱表征

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摘要

Internal photoemission spectroscopy measurements have been performed to study the electrical characteristics of Schottky diodes on boron-doped single-crystalline chemical vapor deposited (SC-CVD) diamond. These measurements were compared with current-voltage (I-V) and current-temperature (I-T) measurements. Schottky contact barrier heights and ideality factors have been measured on Schottky contacts formed on four samples with Au, Ni, and Al contact metallizations. I-V and I-T measurements were performed in the temperature range from 300 K to 500 K. The internal photoemission method, which is less influenced by local variations in the Schottky barrier height than the other two methods, yielded the highest values of Schottky barrier heights to p-type material: (PHI)_(B) velence 1.78 eV to 2.10 eV, depending on the choice of contact metal and sample boron concentration.
机译:已进行内部光发射光谱测量,以研究掺硼单晶化学气相沉积(SC-CVD)金刚石上的肖特基二极管的电特性。将这些测量值与电流电压(I-V)和电流温度(I-T)测量值进行比较。肖特基接触势垒高度和理想因子已在四个具有Au,Ni和Al接触金属化样品上形成的肖特基接触上进行了测量。 IV和IT测量在300 K至500 K的温度范围内进行。内部光发射法比其他两种方法受肖特基势垒高度的局部变化影响较小,从而使肖特基势垒高度的最大值达到p。型材料:(PHI)_(B)速度在1.78 eV到2.10 eV之间,取决于接触金属和样品硼浓度的选择。

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