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首页> 外文期刊>Journal of Electronic Materials >Growth of the Dilute Magnetic Semiconductor GaMnN by Molecular-Beam Epitaxy
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Growth of the Dilute Magnetic Semiconductor GaMnN by Molecular-Beam Epitaxy

机译:分子束外延生长稀磁半导体GaMnN

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摘要

Growth by molecular-beam epitaxy (MBE) of the dilute-magnetic alloy GaMnN is reported. The Mn concentration, as determined by Auger electron spectroscopy (AES), is found to be linear with increasing Mn-cell temperature up to approx43at.%Mn. No second phases are observed for Mn levels below 9 at.%. The cubic-phase Mn_4N is found to be the thermodynamically stable phase at the growth conditions used to produce GaMnN. Hysteresis in M versus H is observed in both GaMnN and GaMnN:C grown on both sapphire and metal-oxide chemical-vapor deposition (MOCVD) GaN at several growth temperatures. Magnetotransport results show the anomalous Hall effect, negative magnetoresistance, and magnetic hysteresis, indicating that Mn is incorporating into the GaN and forming the ferromagnetic-semiconductor GaMnN. Room-temperature hystersis is obtained in magnetization measurements with an optimum Mn concentration of approx3 at.%.
机译:据报道,稀磁合金GaMnN的分子束外延(MBE)生长。通过俄歇电子能谱法(AES)确定的Mn浓度随Mn电池温度升高至高达约43at%Mn呈线性关系。低于9at。%的Mn含量没有观察到第二相。发现立方相Mn_4N在用于生产GaMnN的生长条件下是热力学稳定相。在蓝宝石和金属氧化物化学气相沉积(MOCVD)GaN上在几个生长温度下生长的GaMnN和GaMnN:C都观察到M与H的磁滞。磁传输结果显示出异常的霍尔效应,负磁阻和磁滞现象,表明Mn掺入GaN中并形成铁磁半导体GaMnN。在磁化测量中可获得室温迟滞,其最佳Mn浓度约为3 at。%。

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