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Pulsed Laser Deposition of Bismuth Telluride Thin Films for Microelectromechanical Systems Thermoelectric Energy Harvesters

机译:用于微机电系统热电能量收集器的碲化铋薄膜的脉冲激光沉积

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摘要

This article reports on the development of thin films of p- and n-type bismuth telluride compounds which are suitable for microelectromechanical systems (MEMS) thermoelectric energy harvesters. Films were prepared by the pulsed laser deposition technique. It is shown that the thin films of binary Bi-Te alloys outperformed considerably their ternary counterparts. Furthermore, the highest thermoelectric figure of merit (ZT) was found to be 0.39 for the p-type Bi_(32)Te_(68) alloy, whereas the optimal n-type alloy was Bi_(25)Te_(75), which was characterized by a relatively low stress gradient.
机译:本文报道了适用于微机电系统(MEMS)热电能量收集器的p型和n型碲化铋化合物薄膜的开发。通过脉冲激光沉积技术制备膜。结果表明,二元Bi-Te合金薄膜的性能大大优于三元Bi-Te合金。此外,发现p型Bi_(32)Te_(68)合金的最高热电品质因数(ZT)为0.39,而最佳n型合金为Bi_(25)Te_(75)。应力梯度较低。

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