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InGaN/GaN Quantum Well Growth on Pyramids of Epitaxial Lateral Overgrown GaN

机译:外延横向生长GaN的金字塔上的InGaN / GaN量子阱生长

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摘要

InGaN/GaN quantum wells (QW) were grown by metalorganic chemicalvapor deposition (MOCVD) on pyramids of epitaxial lateral overgrown(ELO) GaN samples. The ELO GaN samples were grown by MOCVD onsapphire (0001) substrates that were patterned with a SiN. mask.Scanning electron microscopy and cathodoluminescence (CL) imagingexperiments were performed to examine lateral variations in structureand QW luminescence energy. CL wavelength imaging (CLWI) measurementsshow that the QW peaks on the top of the grooves are red-shifted incomparison with the QW emission from the side walls. The results showthat In atoms have migrated to the top of the pyramids during the QWgrowth. The effects of V/III ratio, growth temperature as well as ELOGaN stripe orientation on the QW properties are also studied.
机译:InGaN / GaN量子阱(QW)通过金属有机化学气相沉积(MOCVD)在外延横向生长(ELO)GaN样品的金字塔上生长。通过MOCVD在用SiN图案化的蓝宝石(0001)衬底上生长ELO GaN样品。进行了扫描电子显微镜和阴极发光(CL)成像实验,以检查结构和QW发光能量的横向变化。 CL波长成像(CLWI)测量表明,凹槽顶部的QW峰值与侧壁的QW发射相比发生了红移。结果表明,在QWgrowth期间,In原子已迁移到金字塔的顶部。还研究了V / III比,生长温度以及ELOGaN条纹取向对QW性能的影响。

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