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The Application of Rapid Thermal Processing Technology to the Manufacture of Integrated Circuits-An Overview

机译:快速热处理技术在集成电路制造中的应用概述

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Like many of the technologies used to process integrated circuits, the road to manufacturing for rapid thermal processing (RTP) has been twisted. What began as a speculative laboratory apparatus has evolved into cornerstone of IC technology. Qualities that make RTP desirable for IC manufacture include the ability to process wafers individually, the ability to minimize the time wafers spend at elevated temperature, the convenience of clustering RTP to other systems, and the possibility of maintaining cold reactor walls. This paper will review how these properites make RTP desirable. The paper also will present an overview of the difficulties surrounding the use of RTP and describe how many serious hurdles have been overcome. It will summarize the evolution of RTP from a curiosity to a mainstay technology in building integrated circuits. It then will describe SEMATECH's role in working with RTP, ending with a direction for future applicaiton of RTP based ont eh National Technology Roadmap for Semiconductors (NTRS).
机译:像用于处理集成电路的许多技术一样,快速热处理(RTP)的制造之路也曲折。最初是一种投机实验室设备,现已演变为IC技术的基石。使RTP成为IC制造所需的质量包括:单独处理晶片的能力,使晶片在高温下花费的时间最小化的能力,将RTP群集到其他系统的便利性以及维持冷反应器壁的可能性。本文将回顾这些特性如何使RTP变得可取。本文还将概述有关使用RTP的困难,并描述已经克服了多少严重的障碍。它将概述RTP在构建集成电路中从好奇心到主流技术的演变。然后,它将描述SEMATECH在RTP中的作用,最后根据《国家半导体技术路线图》(NTRS)为将来应用RTP指明了方向。

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