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首页> 外文期刊>Journal of Electronic Materials >Long-Term Structural Instabilities in Undoped and Nitrogen-Doped Ge2Sb2Te5 Films
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Long-Term Structural Instabilities in Undoped and Nitrogen-Doped Ge2Sb2Te5 Films

机译:未掺杂和氮掺杂的Ge2Sb2Te5薄膜的长期结构不稳定性

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摘要

We investigated the compositional, microstructural, and electrical properties of undoped and nitrogen-doped Ge2Sb2Te5 films subjected to long-term thermal annealing under air atmosphere. Considering the absence of chemical and structural changes, the sheet resistances of samples annealed at 200A degrees C may potentially be related to changes in the lattice parameters. The disappearance of Ge-N bonds and decrease of Ge and N concentrations in samples treated at 300A degrees C were found to depend on the cubic to hexagonal phase transition.
机译:我们研究了在空气气氛下经过长期热退火的未掺杂和氮掺杂的Ge2Sb2Te5薄膜的组成,微观结构和电性能。考虑到不存在化学和结构变化,在200A℃退火的样品的薄层电阻可能与晶格参数的变化有关。发现在300A摄氏度下处理的样品中Ge-N键的消失以及Ge和N浓度的降低取决于立方到六方相变。

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