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Enhanced adhesion and thermal stability of Al/Cr film on indium-tin-oxide (ITO)-coated glass

机译:涂有氧化铟锡(ITO)的玻璃上的Al / Cr膜具有增强的附着力和热稳定性

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摘要

Metallization of indium-tin-oxide (ITO)-coated glass using an Al/Cr composite thin film is a common practice for chip-on-glass packaging.However,the reliability of the Cr/ITO interface is always a problem bvecause of poor adhesion due to the chemical inertness of ITO.In this study,the adhesion strength between a Cr film and ITO coated glass was enhanced by forming an intermediate oxide layer at the interface.To find out the optimal interface condition,various amounts of oxygen were doped at the interface.The results show that the adhesion strentgth and thermal stability are both enhanced by the interfacial doping of oxygen.This enhancement is found to be related to the flow rate of oxygen and,therefore,to the oxide thickness.Maximum improvement occurs when the flow rate of oxygen is set at 6 sccm during doping,and at this rate the interface oxide thicknes also reaches its maximum value.Under this condition,the Cr/ITO interface also shows the best thermal stability.Wire bond testing shows that the wire pull strength is affected by the thickness of Al film.The results of this study show that the Al film should not be thicker than 1 mum.
机译:使用Al / Cr复合薄膜对涂有氧化铟锡(ITO)的玻璃进行金属化是玻璃上芯片封装的一种常见做法,但是Cr / ITO界面的可靠性始终是一个问题,原因很差本研究通过在界面处形成中间氧化物层来增强Cr膜与ITO涂层玻璃之间的粘合强度。为找出最佳的界面条件,需掺杂不同数量的氧气结果表明,氧的界面掺杂均提高了粘合强度和热稳定性。这种提高与氧的流速有关,因此与氧化物的厚度有关。在掺杂过程中,氧气的流速设置为6 sccm,并且在此速率下,界面氧化物的厚度也达到最大值。在这种条件下,Cr / ITO界面也显示出最佳的热稳定性。 ws表示拉线强度受Al膜厚度的影响。研究结果表明,Al膜的厚度不应大于1微米。

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