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Multilayer Metal Film Plating on Glass

机译:玻璃上的多层金属膜电镀

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摘要

It has been shown that an under-layer of SiO2 · nH2O on a silicate glass surface, promotes the adsorption of Sn(II) hydroxycompounds, resulting in the formation of Sn-O-Si chemical bonds. It also: contributes to the formation of monodispersed Sn(II) compound nanoparticles; levels the glass surface micro-relief; ensures the deposition of fine-grained metal films; increases the rate of Ni-P and Cu electroless plating; and increases the rate of the adhesion interaction between the surface of the silicate glass and metal films. It opens up the possibility of electroless and electrochemical plating of 5-10 urn thick multilayer metal and alloy films.
机译:已经显示出,在硅酸盐玻璃表面上的SiO 2·nH 2 O的底层促进了Sn(II)羟基化合物的吸附,导致形成Sn-O-Si化学键。它还:有助于单分散Sn(II)化合物纳米颗粒的形成;平整玻璃表面微浮雕;确保细晶粒金属膜的沉积;提高Ni-P和Cu化学镀的速率;并增加了硅酸盐玻璃表面与金属膜之间的粘附相互作用的速率。它为5-10微米厚的多层金属和合金膜的化学镀和电化学镀膜开辟了可能性。

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