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首页> 外文期刊>Journal of Applied Spectroscopy >INFLUENCE OF ANNEALING ON THE OPTICAL PARAMETERS OF In_2S_3 THIN FILMS PRODUCED BY THERMAL EVAPORATION
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INFLUENCE OF ANNEALING ON THE OPTICAL PARAMETERS OF In_2S_3 THIN FILMS PRODUCED BY THERMAL EVAPORATION

机译:退火对热蒸发制备In_2S_3薄膜的光学参数的影响

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摘要

In_2S_3 thin films are grown on glass substrates by vacuum thermal evaporation followed by annealing in vacuum between 330 and 400℃ for different time durations. We have investigated the influence of the annealingparameters on the characteristics of thin films. It is shown that thermal treatment changed the crystal structure and optical energy band gap of In_2S_3 thin films. Two energy band gaps were determined for all the films, one indirect and the other direct.
机译:In_2S_3薄膜通过真空热蒸发在玻璃基板上生长,然后在330至400℃的真空中退火不同的时间。我们研究了退火参数对薄膜特性的影响。结果表明,热处理改变了In_2S_3薄膜的晶体结构和光能带隙。确定了所有薄膜的两个能带隙,一个是间接的,另一个是直接的。

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