The conductive behavior and structural characteristics in the I+-beam-implanted layer of plasma-polymerized pyrrole film

摘要

A dense organic film was prepared by plasma polymerization of pyrrole. A 20 keV I+ implantation at a fluence of 1 x 10(16) ions cm(-2) was used to produce a conducting surface layer due to doping. The characteristics of the implanted layer have been investigated using ion beam analysis techniques, X-ray photoelectron spectroscopy, and near-infrared to ultraviolet spectroscopy. The charge carriers transport in this implanted layer was also analyzed in the temperature region of 120 to 297 K. (C) 1998 John Wiley & Sons, Inc. J Appl Polym Sci 69: 1743-1751, 1998. [References: 26]