Chemical Vapor Deposition of Iridium and Rhodium Coatings from Hydridotetrakis(trifluorophosphine) Complexes

摘要

Chemical vapor deposition (CVD) of iridium and rhodium coatings using hydridotetrakis(trifluorophosphine) complexes as the precursor is presented. These inorganic, volatile, carbon- and oxygen-free compounds undergo a decomposition reaction to form highly pure iridium and rhodium metallic films on molybdenum substrates in the CVD reactor at growth temperatures as low as 450°C. The dependences of the deposition process and characteristics of the iridium and rhodium coatings have been investigated.