Economical Analysis and Optimization of a Low Pressure Chemical Vapor Deposition (LPCVD) Reactor

摘要

An economical analysis of the LPCVD hot wall tubular reactor functioning is presented including equipment amortization, clean room location, supplies, maintenance, labor, gas and energy consumption. From a technical point of view, CVD1 model is used to characterise the phenomena involved during polysilicon deposition, linking growth rate distribution to operating conditions. An optimization is then realized in three different cases with and without a temperature profile. By this study the main costs of CVD operation such as gases consumption and equipment amortization are identified, and the total cost has been drastically reduced by using a temperature profile.