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Tribology of nitrogen ion-implanted diamond films in high temperature

机译:高温下氮离子注入金刚石薄膜的摩擦学

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A low shear resistance layer was formed on a diamond surface to reduce wear under high temperature conditions. After finishing by polishing CVD, a diamond layer was treated by ion implantation. Tribological characteristics were evaluated under high temperature conditions and the following results were obtained. (1) At temperatures of 25℃ and 200℃, diamond films showed a low friction of below μ = 0.2, but at 400℃, the coefficient of friction increased to about μ = 0.4. In contrast, ion-implanted diamond films showed an effective reduction of friction at 200℃, the coefficient of friction remaining low even at 400℃. This indicated a notable effect of the ion-implantation treatment. The phenomenon was explained by the formation of an amorphous carbon layer by the ion-implantation process and its functioning as a low shear resistance layer. (2) At a temperature of 600℃, both diamond and ion-implanted diamond films showed a sharp increase in the coefficient of friction, but in both cases, damage was comparatively low. An increase of friction of ion-implanted diamond films at 600℃ was caused by a temperature rise on an amorphous layer formed by ion implantation and by the removal of the layer by friction. (3) A low friction that was shown by a diamond film and an ion-implanted diamond film at room temperature and 200℃ was affected by the formation of the adsorbed surface layer and a layer formed by friction.
机译:在金刚石表面上形成低剪切强度层,以减少高温条件下的磨损。通过抛光CVD进行抛光之后,通过离子注入处理金刚石层。在高温条件下评估了摩擦学特性,并获得了以下结果。 (1)在25℃和200℃的温度下,金刚石膜的摩擦系数低至μ= 0.2以下,而在400℃时,摩擦系数增加到μ= 0.4左右。相反,离子注入的金刚石薄膜在200℃时显示出有效的摩擦减小,即使在400℃时,摩擦系数仍然很低。这表明离子注入处理的显着效果。通过离子注入工艺形成非晶碳层及其作为低剪切阻力层的作用来解释该现象。 (2)在600℃的温度下,金刚石膜和离子注入金刚石膜都显示出摩擦系数的急剧增加,但是在两种情况下,损伤都相对较低。离子注入金刚石薄膜在600℃时的摩擦力增加是由于通过离子注入形成的非晶层上的温度升高以及通过摩擦去除了该层而引起的。 (3)在室温和200℃下金刚石膜和离子注入金刚石膜表现出的低摩擦受到吸附表面层和通过摩擦形成的层的影响。

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