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Electrical conductivity improvement by iodine doping for diamond-like carbon thin-films deposited by microwave surface wave plasma CVD

机译:微波表面波等离子体CVD沉积的类金刚石碳薄膜通过碘掺杂改善电导率

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摘要

We report the effects of iodine (I) doping on the optical and structural properties, and electrical conductivity of diamond-like carbon (DLC) thin-films grown on silicon, glass and quartz substrates by microwave surface wave plasma chemical vapor deposition at low temperature (<100 deg C). For film deposition, we used argon and methane as plasma source gases. The films were characterized by UV/VIS/NIR spectroscopy, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and current-voltage (I-V) characteristics. The optical band gap of the films decreased from 3.5 to 1.9 eV corresponding to non-doping to I-doping conditions. The XPS results confirm the successful doping of I in the films. The FTIR result shows the effect of I-doping on reduction of sp~3-bonded carbon in the film. The I - V measurement shows I-doping induced electrical conductivity of the DLC film.
机译:我们报告了碘(I)对通过微波表面波等离子体化学气相沉积在低温下生长在硅,玻璃和石英基板上的类金刚石碳(DLC)薄膜的光学和结构性质以及导电性的影响(<100摄氏度)。对于膜沉积,我们使用氩气和甲烷作为等离子体源气体。通过UV / VIS / NIR光谱,X射线光电子能谱(XPS),傅立叶变换红外(FTIR)光谱和电流-电压(I-V)特性对薄膜进行了表征。薄膜的光学带隙从3.5 eV下降到1.9 eV,对应于非掺杂到I掺杂的条件。 XPS结果证实了薄膜中I的成功掺杂。 FTIR结果显示了I掺杂对减少薄膜中sp〜3键合碳的影响。 I-V测量显示了DLC膜的I掺杂诱导的电导率。

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