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Coating of DLC film by pulsed discharge plasma CVD

机译:通过脉冲放电等离子体CVD涂覆DLC膜

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Diamond-like carbon (DLC) films were deposited onto Ti plate substrate by means of pulsed discharge (PD) plasma chemical vapor deposition (CVD) from gas mixture of methane and hydrogen, and their structures were investigated with transmission electron microscope (TEM). When the polarity of the substrate was negative, the DLC film was grown on the substrate. The transmission electron diffraction (TED) pattern of the deposited film, which was shaved with knife from the surface of the substrate, showed that both TiC and diamond structures were formed, showing that the DLC film can be coated with good adhesion by means of the formation of TiC interlayer. The coatings of DLC films onto a stainless steel plate and a drill of WC, on which Ti film were deposited previously, was also succeeded by the PD plasma CVD method with good adhesion.
机译:通过脉冲放电(PD)等离子化学气相沉积(CVD)从甲烷和氢气的混合气体中将类金刚石碳(DLC)膜沉积到Ti板基板上,并用透射电子显微镜(TEM)研究其结构。当基板的极性为负时,在基板上生长DLC膜。用刀从基材表面刮下来的沉积膜的透射电子衍射(TED)图表明,同时形成了TiC和金刚石结构,这表明DLC膜可以通过DLC膜进行良好的附着力涂覆。 TiC夹层的形成。还通过PD等离子体CVD方法以良好的粘附性成功地在不锈钢板上涂覆了DLC膜,并在其上预先沉积了Ti膜的WC钻头上。

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