PLASMA CVD DEVICE, FILM DEPOSITION METHOD, AND DLC COATING PIPE ARRANGEMENT

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD device capable of depositing a thin film on the inner face of a pipe arrangement without any vacuum vessel.SOLUTION: According to one aspect of the invention, a plasma CVD device comprises: a first sealing member for sealing one end of a pipe arrangement 11; a second sealing member for sealing the other end of the pipe arrangement; a gas introduction mechanism connected to the first sealing member for introducing a raw material gas into the pipe arrangement; an exhaust mechanism connected to the second sealing member for evacuating the inside of the pipe arrangement; an electrode 15 disposed in the pipe arrangement; and a high-frequency power source 14a electrically connected with the electrode or the pipe arrangement.