Nano-diamond films produced from CVD of camphor

摘要

Nano-diamond films were deposited by chemical vapour deposition (CVD) of camphor(C{sub}10H{sub}16O) and hydrogen (～75 vol.%) on glass (at 523-623 K) and quartz Si substrate(at 523-713 K). The films had low values of surface roughness (～17 nm on quartz) along with highvalues of hardness and band gap. IR studies of the films deposited on Si substrate indicated the filmsto be transparent in the IR region. Optical properties of the films deposited on quartz (fused silica) andglass (Corning) substrates were studied. The absorption data in the below band gap region wereutilized to estimate the strain (2-12× 10{sup}-3), stress (1.9- 8.4 GPa) and hardness (47-62 GPa)in the films. The ETIR studies of the films did not show absorption around 2900 cm{sup}-1, while theRaman spectra indicated a sharp peak (with FWHM～8 cm{sup}-1) at 1337 cm{sup}-1corresponding to good quality diamond films.