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Study on hybrid nano-diamond films formed by plasma chemical vapor deposition (CVD)

机译:等离子体化学气相沉积(CVD)形成的杂化纳米金刚石薄膜的研究

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摘要

Diamond-like carbon (DLC) films made by plasma chemical vapor deposition (CVD) have many useful properties for tribological characteristics. Especially, friction coefficient is very low. However, the films have weak points i.e., very low heatproof temperature of less than 300 degrees C and low hardness insufficient for industrial applications like machine tools. On the other hand, it is well known that diamond films made by plasma CVD have excellent hardness. But, they also have inferior properties for industrial applications, such as higher surface roughness and lower critical load than DLC films. In this study, we developed hybrid nano-diamond (HND) films that are formed by alternately depositing DLC films and diamond films in a same chamber. The HND films have sufficiently high hardness as well as excellent tribological characteristics due to the multi-layer structure of DLC and diamond. The process of forming HND films are discussed. (c) 2005 Elsevier Ltd. All rights reserved.
机译:通过等离子体化学气相沉积(CVD)制成的类金刚石碳(DLC)膜具有许多有用的摩擦学特性。特别地,摩擦系数非常低。然而,该膜具有薄弱点,即,非常低的耐热温度低于300℃,并且硬度低,不足以用于机械工具等工业应用。另一方面,众所周知,通过等离子体CVD制造的金刚石膜具有优异的硬度。但是,它们在工业应用中的性能也较差,例如比DLC膜更高的表面粗糙度和更低的临界载荷。在这项研究中,我们开发了混合纳米金刚石(HND)膜,该膜是通过在同一腔室中交替沉积DLC膜和金刚石膜而形成的。由于DLC和金刚石的多层结构,HND膜具有足够高的硬度以及出色的摩擦学特性。讨论了形成HND膜的过程。 (c)2005 Elsevier Ltd.保留所有权利。

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