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Photoemission properties and hydrogen surface coverage of CVD diamond films

机译:CVD金刚石薄膜的光发射特性和氢表面覆盖率

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UV assisted photoelectron emission measurements are carried out using a xenon lamp as the excitation source.Free-standing diamond surfaces treated at diverse experimental conditions give rise to varying photocurrent intensities.In order to gain a better understanding of these phenomena,different surfaces are prepared:as-grown,hydrogenated,oxidized and annealed.The hydrogenated film is obtained from optimised treatment in hydrogen plasma.The highest emission photocurrent is obtained with the hydrogenated diamond film in agreement with in situ surface conductivity values.Moreover,in situ photoelectric measurements performed in a vacuum chamber demonstrate that the emission photocurrent increases when the sample is exposed to air.Indeed,it is now agreed that the formation of an adsorbate layer on hydrogenated surfaces leads to a decrease of the work function.Two electrons emission thresholds are observed:the highest energy emission is close to the bandgap value (5.5 eV)and the lowest is located near 4.5 eV corresponding to defect levels in the bandgap.Both emissions are dependent on the surface coverage but the main striking result is the increase of the intensity of the 4.5 eV emission for hydrogenated diamonds in contact with air.Optical absorption experiments are compared with the photoconductivity measurements.Laser excited photoluminescence at 514 nm revealed defects corresponding to a 690 nm broad band emission sensitive to the surface coverage.
机译:使用氙灯作为激发源进行紫外线辅助的光电子发射测量。在不同的实验条件下处理的独立金刚石表面会产生变化的光电流强度。为了更好地理解这些现象,准备了不同的表面:氢化膜是通过在氢等离子体中进行优化处理而得到的。氢化金刚石膜与原位表面电导率值相符,可以获得最高的发射光电流。此外,在原位进行了光电测量。真空室表明当样品暴露于空气中时发射光电流增加。的确,现在已经同意在氢化表面上形成吸附物层会导致功函数降低。观察到两个电子发射阈值:最高的能量发射接近带隙值(5.5 eV),最低的是l在与带隙中的缺陷水平相对应的4.5 eV附近发生。两种排放都取决于表面覆盖率,但主要的打击结果是与空气接触的氢化钻石4.5 eV发射强度的增加。在514 nm处的激光激发光致发光揭示了对应于对表面覆盖敏感的690 nm宽带发射的缺陷。

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