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机译:合成金刚石电极:表面微观粗糙度对钛上CVD金刚石薄膜的电化学性能的影响
Frumkin Institute of Electrochemistry Russian Academy of Sciences;
Frumkin Institute of Electrochemistry Russian Academy of Sciences;
Frumkin Institute of Electrochemistry Russian Academy of Sciences;
Industrial Technology Research InstituteDepartment of Materials Science and Engineering National Tsing Hua University;
Department of Materials Science and Engineering National Tsing Hua University;
Institute of Physical Chemistry Russian Academy of Sciences;
Institute of Physical Chemistry Russian Academy of Sciences;
General Physics Institute Russian Academy of Sciences;
General Physics Institute Russian Academy of Sciences;
diamond; electrochemical kinetics; microroughness; thin-film electrode; titanium substrate;
机译:合成金刚石电极:表面微粗糙度对钛上CVD金刚石薄膜的电化学性能的影响
机译:CVD金刚石膜厚度对合成金刚石薄膜电极电化学性能的影响
机译:CVD金刚石膜厚度对合成金刚石薄膜电极电化学性能的影响
机译:MPCVD在钛基板上用作臭氧发生剂的硼掺杂金刚石薄膜的电化学性能
机译:导电微晶和纳米晶金刚石薄膜以及氢化玻璃碳电极的生长,表征和电化学性能
机译:通过掺入合成的微金刚石增强了基于聚二甲基硅氧烷的微流体装置和薄膜的理化性能
机译:CVD钻石电影的新方面。导电金刚石薄膜的电化学应用。
机译:纳米晶CVD金刚石薄膜211的形貌和电子发射特性