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Process for deposition of films of diamond CVD with growth in depth on the external and internal superfu00eccies three dimensionally porous titanium and porous titanium electrode three dimensionally

机译:在三维三维多孔钛和三维三维多孔钛电极上沉积深度不断增长的金刚石CVD膜的方法

摘要

Process for deposition of films of diamond CVD with growth in depth on the external and internal superfu00eccies three dimensionally porous titanium and porous titanium electrode three dimensionally.The present invention relates to a process used for the deposition of a layer of diamond CVD film on a porous material three dimensionally, and used a substrate of titanium and titanium alloy as the material three dimensionally porous, with pores and plans ext. Ernos and internal open and interconnected, and after the growth in depth.A surface adiamantada in single piece, as well as to three dimensionally porous electrodes of titanium and titanium alloy obtained by the said process.
机译:在三维外表面和内部三维表面上深度生长的金刚石CVD膜的沉积方法和三维三维多孔钛电极上的深度生长方法。本发明涉及一种在其上沉积金刚石CVD膜层的方法一种三维材料的多孔材料,并使用钛和钛合金作为三维三维材料的材料,带有孔和平面。 Ernos与内部打开并相互连接,并随着深度的增长而相互连接。通过上述方法获得的钛和钛合金的三维多孔电极呈一体的表面全月膜。

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