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Bulk CVD diamond devices for UV and XUV detection

机译:用于UV和XUV检测的大块CVD金刚石设备

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摘要

Owing to its semiconducting properties (wide band gap,high electron and hole mobility),diamond is an interesting material for UV and XUV photodetection.In the present study,we have characterized UV and XUV diamond photodetector efficiency using bulk photoconductivity instead of usual coplanar devices.For comparisons,chemical vapor deposition diamond films of 200-mum thickness have been fabricated for working either in bulk configuration (BC) or surface configuration.They have been tested under nanosecond laser irradiation in the gap region (over-gap 193 and 213 nm;sub-gap 266 nm).For each wavelength,photoconductive responses of devices have been measured as a function of bias voltage (AC and DC) and laser fluences.With BC linear responses are obtained up to 0.5 mJ/cm~2 at 193 nm and 40 mJ/cm~2 at 266 nm.However,with BC a space charge effect appears under 193- and 213-nm irradiation,reducing the sensitivity of the detector.Such drawback is overcome by using AC bias.The suitability of the devices for detecting UV laser pulses or intense XUV fast discharge lamp in discussed.
机译:由于其半导体特性(宽带隙,高电子和空穴迁移率),金刚石是用于UV和XUV光电检测的有趣材料。在本研究中,我们使用体光电导性代替常规共面器件表征了UV和XUV金刚石光电检测器的效率。为了进行比较,我们制作了厚度为200μm的化学气相沉积金刚石膜,以使其可以在本体结构(BC)或表面结构中工作。它们已经在间隙区域(间隙193和213 nm)的纳秒激光辐射下进行了测试;亚间隙266 nm)。对于每种波长,已测量了器件的光电导响应与偏置电压(AC和DC)和激光能量密度的关系。在BC情况下,在193°C时,线性响应最高可达0.5 mJ / cm〜2在266 nm处达到100 nm和40 mJ / cm〜2的光通量。然而,使用BC时,在193 nm和213 nm的照射下会出现空间电荷效应,从而降低了检测器的灵敏度。使用AC偏压可以克服这种缺点。讨论了用于检测UV激光脉冲或强XUV快速放电灯的设备。

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