A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates

摘要

State-of-the-art polycrystalline chemically vapor-deposited (CVD) diamond films and substrates have rough surfaces and nonuniform thicknesses which can adversely affect their application. Polishing and planarization can be used to remedy thesedrawbacks. In recent years, many polishing and planarization techniques have been reported, each having technological advantages and disadvantages. A specific polishing technique should be chosen based on these advantages and disadvantages, depending onthe particular CVD diamond film application. Polishing and planarization techniques are reviewed in this paper. Parameters considered include polishing rate, surface finish requirements, and economic impact. To aid in the understanding and evaluation ofdiamond polishing techniques for applications, polishing mechanisms are also reviewed. Finally, CVD diamond applications and their surface roughness requirements are presented.