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A SUBSTRATE FOR FORMING CHEMICAL VAPOR-DEPOSITED DIAMOND FILM AND A DIAMOND FILM
A SUBSTRATE FOR FORMING CHEMICAL VAPOR-DEPOSITED DIAMOND FILM AND A DIAMOND FILM
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机译:用于形成化学气相沉积金刚石膜的基质和金刚石膜
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摘要
There is disclosed a base material for forming a diamond film by vapor phase synthesis, wherein diamond particles having a particle (13) diameter of 2 nm to 100 nm exist at a density of 1 x 108 to 1 x 1013 number/cm2 on a surface of the base material (11), and spaces among the diamond particles are filled with diamond particles having a particle diameter of less than 2 nm. There can be provided a base material for forming a diamond film (14) by vapor phase synthesis which can provide a high generation density of diamond nuclei and a continuous diamond film even with an extremely small film thickness such as 10 mu m or less. IMAGE
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机译:公开了用于通过气相合成形成金刚石膜的基材,其中以1×10 8〜1×10 13的密度存在粒径(2)为2nm至100nm的金刚石颗粒。基材(11)的表面上的密度为/ cm 2 / cm 2,并且金刚石颗粒之间的空间填充有粒径小于2nm的金刚石颗粒。可以提供一种通过气相合成形成金刚石膜(14)的基材,该基材即使具有极小的膜厚例如10μm以下,也可以提供高的金刚石核生成密度和连续的金刚石膜。 <图像>
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