A critical review of chemical vapor-deposited (CVD) diamond for electronic applications [Review]

Railkar TA.; Windischmann H.; Malshe AP.; Naseem HA.; Davidson JL.; Brown WD.; Kang WP.

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A critical review of chemical vapor-deposited (CVD) diamond for electronic applications [Review]

机译：对用于电子应用的化学气相沉积（CVD）金刚石的严格审查[审查]

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The objective of this article is to describe the present understanding of the growth, processing, and properties of diamond fur electronic applications. [References: 378]

机译：本文的目的是描述对钻石毛皮电子应用的生长，加工和特性的当前理解。 [参考：378]

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《Critical Reviews in Solid State and Materials Sciences》 |2000年第3期|共115页
作者
Railkar TA.; Windischmann H.; Malshe AP.; Naseem HA.; Davidson JL.; Brown WD.; Kang WP.;
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正文语种 eng
中图分类固体物理学;
关键词
Field-effect transistors; Boron-doped diamond; Thin-film diamond; Ion-implanted diamond; P-n-junction; Capacitance-voltage measurements; Scanning-tunneling-microscopy; Cyclotron-resonance plasma; Bias-enhanced nucleation; Polycrystalline diamond;

机译：场效应晶体管;掺硼金刚石;薄膜金刚石;离子注入金刚石;P-n结;电容电压测量;扫描隧道显微镜;回旋共振等离子体;偏压增强成核;多晶金刚石;

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1. A critical review of chemical vapor-deposited (CVD) diamond for electronic applications [Review] [J] . Railkar TA., Windischmann H., Malshe AP., Critical Reviews in Solid State and Materials Sciences . 2000,第3期

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2. A review of the industrial applications of CVD diamond [J] . R.S. Sussmann, J.R Brandon, S.E Coe Industrial Diamond Review . 2001,第591期

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A critical review of chemical vapor-deposited (CVD) diamond for electronic applications [Review]

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