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Comparison of GaN and A1N nucleation layers for the oriented growth of GaN on diamond substrates

机译:GaN和A1N成核层在金刚石衬底上定向生长GaN的比较

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In this study, {0001} oriented GaN crystals have been grown on freestanding, polycrystalline diamond substrates using A1N and GaN nucleation layers (NLs). XRD measurements and SEM analysis showed that the application of a thin A1N NL gives the best structural results, because A1N has a thermal expansion coefficient in between GaN and diamond and thus delocalizes the stress to two interfaces. The optical quality of the layers, investigated with Raman microscopy and photoluminescence spectroscopy, is similar. Although no lateral epitaxy is obtained, new insight is gained on the nucleation of GaN on diamond substrates facilitating the growth of GaN epilayers on polycrystalline diamond substrates.
机译:在这项研究中,使用AlN和GaN成核层(NLs)在独立的多晶金刚石衬底上生长了{0001}取向的GaN晶体。 XRD测量和SEM分析表明,薄AlN NL的应用可获得最佳的结构效果,因为AlN在GaN和金刚石之间具有热膨胀系数,从而将应力分散到两个界面上。用拉曼显微镜和光致发光光谱法研究的层的光学质量相似。尽管没有获得横向外延,但是在金刚石基底上的GaN成核方面获得了新的见识,从而促进了多晶金刚石基底上GaN外延层的生长。

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