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Fretting wear and electrochemical corrosion of well-adhered CVD diamond films deposited on steel sub strates with a WC–Co interlayer

机译:附着在具有WC-Co夹层的钢基板上的附着良好的CVD金刚石膜的微动磨损和电化学腐蚀

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摘要

Diamond films have been grownon carbon steel substrates by hot-filament chemical vapour depositionmethods. A Co-containing tungsten-carbide (WC–Co) coating prepared by high velocity oxy-fuel spraying was used as an intermediate layer on the steel substrates to minimize the early formation of graphite (and thus growth of low quality diamond films) and to enhance the diamond film adhesion. The effects of the WC–Co interlayer on nucleation, quality, adhesion, tribological behaviour and electrochemical corrosion of the diamond film wereinvestigated. The diamondfilms exhibit excellent adhesion under Rock well indentation testing (1500 Nload) and when subjected to high-speed, high-load, long-time reciprocating dry sliding ball-on-flat wear tests against a Si_3N_4 counterface in ambient air (500 rpm, 200 N, 300,000 cycles). A WC–Co interlayer with appropriate chemical pretreatment is shown to play an important role in improving the nucleation, quality and adhesion of the diamond film, relative to that shown by substrates without such pretreatment.
机译:金刚石膜已经通过热丝化学气相沉积法在碳钢基底上生长。通过高速氧-燃料喷涂制备的含钴碳化钨(WC-Co)涂层用作钢基底上的中间层,以最大程度地减少石墨的早期形成(从而减少低质量金刚石膜的生长),并增强金刚石膜的附着力。研究了WC-Co中间层对金刚石膜的成核,质量,附着力,摩擦学行为和电化学腐蚀的影响。金刚石膜在岩石压痕测试(1500 Nload)下以及在环境空气(500 rpm,500 rpm)下对Si_3N_4相对表面进行高速,高载荷,长时间往复干式滑动滑动平板磨损试验时表现出优异的附着力200 N,300,000个循环)。与未经预处理的基材相比,采用适当化学预处理的WC-Co中间层在改善金刚石膜的成核,质量和粘附性方面起着重要作用。

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