Influence of atomic bonds on electrical property of boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

摘要

Boron carbon nitride (BCN) films are synthesized with various growth conditions by remote plasma-assisted chemical vapor deposition method. The chemical bonding in the BCN film is modified by the growth condition. Optical and electrical properties are investigated for BCN films with various chemical bonding. Electrical characterization is carried out for the BCN films which have the same bandgap energy and different C composition ratio and have the same C composition ratio and different bandgap energy.