ROTARY DRUM IN FILM DEPOSITION APPARATUS FOR ATOMIC LAYER CHEMICAL VAPOR DEPOSITION AND FILM DEPOSITION APPARATUS FOR ATOMIC LAYER CHEMICAL VAPOR DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a rotary drum in a film deposition apparatus for an atomic layer chemical vapor deposition, which is capable of depositing a multi-layered film, wherein the size of the entire apparatus can be reduced, and to provide the film deposition apparatus for the atomic layer chemical vapor deposition.;SOLUTION: The film deposition apparatus is structured to deposit a film onto an inner surface of a substrate to be treated while winding the substrate around a deposition treatment drum 100 at a prescribed angle and continuously or intermittently transferring the substrate, so that the size of the entire apparatus is reduced. The multi-layered film can be readily deposited by rotating the rotary drum equipped with a film deposition source in the deposition treatment drum.;COPYRIGHT: (C)2013,JPO&INPIT