首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction
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Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction

机译:具有不同层对数的355 nm LaF3 / MgF2高反射器中的机械应力及其减少方法

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摘要

Layer-pair number ranged from 9 to 22 of 355 nm LaF3/MgF2 high reflectors were deposited by boat resistant heating onto substrates of fused silica and K9 glasses, and the total stress was obtained by curvature measurements. The stress increased with incremental layers until crazing happed because of huge tensile stress at higher layer-pair number. Two methods called post-heat treatment in vacuum and double stack design with combination of LaF3/MgF2 and HfO2/SiO2 coatings were found to be effective to reduce the stress and avoid crazing. Especially in the double stack designed coatings, both low stress and high optical properties with transmittance smaller than 0.4% at 355 nm were obtained. Substrates and age effects were also discussed.
机译:通过耐舟加热在熔融石英和K9玻璃的基板上沉积355 nm LaF3 / MgF2高反射层的层对数,范围为9至22。通过曲率测量获得总应力。应力随着层数的增加而增加,直到出现裂纹为止,这是因为在较高的层对数下巨大的拉伸应力。发现了两种方法,称为真空后热处理和结合LaF3 / MgF2和HfO2 / SiO2涂层的双叠层设计,可有效降低应力并避免出现裂纹。特别是在双叠层设计的涂料中,既获得了低应力又具有高光学性能,并且在355 nm处的透射率小于0.4%。还讨论了底物和年龄的影响。

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