THE STUDY OF EPITAXIAL GROWTH OF THIN CU AND AG LAYERS ON AG(110) AND CU(110) USING TOTAL CURRENT SPECTROSCOPY, AES AND WORK FUNCTION MEASUREMENT

摘要

The early stages of the growth of Cu layers deposited on Ag (110) and of Ag layers on Cu (110) have been studied by Total Current Spectroscopy, in conjunction with AES and Delta Phi measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information on the growth types, lattice relaxation and inner potential are extracted from experimental data. [References: 28]