...
【24h】

Analysis on cracking in hard thin films on a soft substrate under Berkovich indentation

机译:Berkovich压痕下软质基底上硬质薄膜的开裂分析

获取原文
获取原文并翻译 | 示例
           

摘要

The present work studied fracture behavior of a thin amorphous carbon film by nano-indentation using a sharp Berkovich indenter. The film was deposited onto a poly-ether-ether-ketone substrate using the plasma deposition method. After indentation tests, both radial cracks and picture-frame cracks were observed. A three-dimensional finite element (FE) model was developed to understand the stress evolution in the thin film under Berkovich indentation. The stress analysis showed that the maximum tensile stress in the film occurs along the indenter edge which contributes to the formation of radial cracks. It was also found that the picture-frame cracks can be developed, depending on the modulus ratio between the film and the substrate. The FE simulation results agree well with experimental observations and shed new insights into fracture mechanics of thin films under Berkovich indentation. (C) 2014 Elsevier Ltd. All rights reserved.
机译:本工作通过使用尖锐的Berkovich压头进行纳米压痕研究了非晶碳薄膜的断裂行为。使用等离子体沉积方法将膜沉积到聚醚醚酮基质上。压痕测试后,观察到径向裂纹和镜框裂纹。建立了三维有限元(FE)模型,以了解在Berkovich压痕作用下薄膜中的应力演化。应力分析表明,膜中的最大拉应力沿压头边缘发生,这有助于形成径向裂纹。还发现,取决于膜与基底之间的模量比,可以产生相框裂纹。有限元模拟结果与实验观察结果非常吻合,并且对在Berkovich压痕作用下薄膜的断裂力学有了新的认识。 (C)2014 Elsevier Ltd.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号