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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Numerical simulation for parameter optimization of silicon purification by electron beam melting
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Numerical simulation for parameter optimization of silicon purification by electron beam melting

机译:电子束熔化提纯硅参数优化数值模拟

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In this paper a mathematical model is developed to investigate the removal of volatile impurities in molten silicon by electron beam melting (EBM) with a high efficiency and low energy consumption. The temperature distribution of molten silicon is obtained using the commercial software FLUENT. Based on the temperature distribution, the vaporization behaviors of phosphorus and silicon are investigated by Langmiur's vaporization theory. The results show that the evaporation rate of silicon during EBM increases exponentially with the increase of beam power, while, it decreases with the increase of scanning radius. The optimal parameters are discussed from the aspect of efficiency and energy saving. The energy consumption decreases with the decrease of scanning radius and with the increase of the beam power. The optimum values are consider to be with a scanning radius of 0.0339 m and a beam power of 23.4 kW for 0.5 kg silicon when phosphorus is removed from 1.44 × 10~(-2) to 1 × 10~(-5) (wt.%).
机译:本文建立了一个数学模型,以研究高效且低能耗的电子束熔化(EBM)去除熔融硅中的挥发性杂质。使用商业软件FLUENT获得熔融硅的温度分布。根据温度分布,利用朗米尔的汽化理论研究了磷和硅的汽化行为。结果表明,EBM过程中硅的蒸发速率随着束功率的增加而呈指数增长,而随着扫描半径的增加而减小。从效率和节能方面讨论了最佳参数。能量消耗随着扫描半径的减小和光束功率的增加而减小。当磷从1.44×10〜(-2)到1×10〜(-5)(wt。%)去除时,0.5 kg硅的最佳扫描半径为0.0339 m,束功率为23.4 kW。 %)。

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