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Research on the Influence of Electron Beam Parameters on Molten Pool Morphologies during Electron Beam Melting Silicon

机译:电子束参数对电子束熔炼硅熔池形态的影响研究

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摘要

Electron beam melting is an effective method to remove volatile impurities in silicon, during which impurities such as P, Al and Ca etc. can be removed to less than 0.3×10~(-4)wt.%. However, so far there is few research on the influence of electron beam parameters, such as beam density and beam size, on molten pool morphology, hence electron beam melting process has not been completely understood, which leads to low energy utilization. In this paper, on the basis of beam size calibration, the influence of beam density and beam size on molten pool morphology is investigated and the concept of melting angle is proposed to characterize molten pool morphology. At the same lime, the optimal molten pool morphology for impurities removal and the corresponding electron beam parameters are also analyzed.
机译:电子束熔化是除去硅中挥发性杂质的有效方法,在此期间可以除去诸如P,Al和Ca等的杂质至小于0.3×10〜(-4)重量%。然而,到目前为止,关于熔融池形态的电子束参数(例如光束密度和光束尺寸)的影响很少,因此尚未完全理解电子束熔化过程,这导致能量利用率低。本文在光束尺寸校准的基础上,研究了梁密度和光束尺寸对熔融池形态的影响,提出了熔化角的概念来表征熔融水池形态。在同一石灰中,还分析了用于去除杂质的最佳熔融池形态和相应的电子束参数。

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