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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Synthesis and characterization of indium phosphide films prepared by co-evaporation technique
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Synthesis and characterization of indium phosphide films prepared by co-evaporation technique

机译:共蒸发技术制备的磷化铟薄膜的合成与表征

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Polycrystalline indium phosphide films were successfully deposited on glass and Si substrates by co-evaporating indium and phosphorus from appropriate crucibles. Microstructural studies indicated the average crystallite size to be ~78 nm. X-ray diffraction pattern indicated reflections from (111), (220) and (311) planes only. The surface roughness of the films was estimated to be 30 nm and the band gap as determined from the transmittance versus wavelength traces was found to be ~1.42 eV. The PL spectrum measured at 300 K was dominated by a strong peak located ~1.41 eV. The intensity of this peak increased significantly when recorded at lower (10 K) temperatures and shifted towards higher energy (~1.54 eV). XPS studies indicated two peaks ~444.5 eV and ~451.9 eV, corresponding to peaks of 3d _(5/2) and 3d _(3/2) of In 3d core while the P 2p peak at ~128.8 eV was assigned to only P in InP. Characteristics Raman peaks for InP at ~303 cm ~(-1) (TO) and ~342 cm ~(-1) (LO) were observed.
机译:通过从合适的坩埚中共蒸发铟和磷,成功地在玻璃和Si基板上沉积了多晶磷化铟薄膜。显微组织研究表明,平均晶粒尺寸为〜78 nm。 X射线衍射图仅表示来自(111),(220)和(311)平面的反射。薄膜的表面粗糙度估计为30 nm,由透射率对波长曲线确定的带隙为〜1.42 eV。在300 K处测得的PL光谱以〜1.41 eV的强峰为主。在较低的温度(10 K)下记录时,该峰的强度显着增加,并向较高的能量(〜1.54 eV)转移。 XPS研究表明,两个峰分别为〜444.5 eV和〜451.9 eV,分别对应于In 3d岩心的3d _(5/2)和3d _(3/2)峰,而在128.8 eV处的P 2p峰仅分配给P。在InP中。在〜303 cm〜(-1)(TO)和〜342 cm〜(-1)(LO)处观察到InP的拉曼峰。

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