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Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

机译:氧化铈化学机械玻璃抛光:所选理化特性对抛光效率的影响

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摘要

Cerium oxide with an excellent glass polishing efficiency was prepared by annealing carbonate or oxalate precursors. The temperature of calcination was identified as a critical parameter that governs the key properties, including the polishing efficiency, of the polishing powders; conversely, the time of calcination appears to be less important. Only the cerium oxides prepared at temperatures above 700 degrees C exhibited good glass polishing capabilities in terms of both the material removal rate and the quality of the polished surface; the maximum polishing efficiency was produced by the samples annealed at 1050 degrees C. Polishing powders were characterized using X-ray diffraction (XRD), advanced microscopic techniques (SEM, TEM), Brunauer-Emmett-Teller (BET) surface area, X-ray photoelectron spectroscopy (XPS) and other techniques. Detailed XRD and microscopic investigations revealed a strong correlation between the crystallinity of cerium oxide and its polishing efficiency, which is consistent with the mechanical effect of the polishing mechanism. However, XPS measurements suggest that the chemical characteristics, namely the presence of the Ce3+ ions, also play an important role in glass polishing and planarization. Both mechanical and chemical contributions to the polishing process are influenced by the calcination temperature. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过对碳酸盐或草酸盐前体进行退火,可以制备出具有优异玻璃抛光效率的氧化铈。煅烧温度被确定为控制抛光粉关键特性(包括抛光效率)的关键参数。相反,煅烧时间似乎不太重要。就材料去除率和抛光表面质量而言,只有在高于700摄氏度的温度下制备的氧化铈才具有良好的玻璃抛光性能。最大的抛光效率是由在1050摄氏度下退火的样品产生的。抛光粉的特征在于X射线衍射(XRD),先进的显微镜技术(SEM,TEM),Brunauer-Emmett-Teller(BET)表面积,X-射线光电子能谱(XPS)等技术。详细的XRD和显微镜研究表明,氧化铈的结晶度与其抛光效率之间存在很强的相关性,这与抛光机理的机械作用是一致的。然而,XPS测量表明化学特性,即Ce3 +离子的存在,在玻璃抛光和平面化中也起着重要作用。机械和化学对抛光过程的贡献都受煅烧温度的影响。 (C)2016 Elsevier B.V.保留所有权利。

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