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Plasma - a new technology for wire annealing and wire cleaning

机译:等离子-导线退火和导线清洁的新技术

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摘要

Today, plasma is found in a vast range of applications, from light tube to laser, from welding to special coatings applications such as the production of cutting tools or surgical implants. Semiconductor technology benefits greatly from plasma technology as well. It is the ability to focus plasma on a small area and reproduce it under the same condition that allows manipulation with small chip structures (micro structures). Plasma based etching, coating and material manipulation processes allow chips to become smaller by orders of magnitude. Plasma is ionised gas. We are used to imagining gas as free atoms and molecules chaotically flying through space. We can generate plasma by inducing energy into gas, to the extent that some atoms break into ions and electrons. This is what happens when we light a matchstick - the flame is excited gas or plasma.
机译:如今,从光管到激光,从焊接到特殊涂层应用(例如生产切削工具或外科植入物),等离子体的应用范围非常广泛。半导体技术也从等离子体技术中受益匪浅。它是将等离子体聚焦在较小区域上并在相同条件下进行复制的能力,该条件允许使用较小的芯片结构(微结构)进行操作。基于等离子的蚀刻,涂层和材料处理工艺可使芯片变小几个数量级。等离子体是离子化气体。我们习惯于将气体想象为自由原子和分子在太空中混沌飞行。我们可以通过将能量感应到气体中来产生等离子体,以使某些原子分解成离子和电子。这是当我们点燃火柴杆时发生的事情-火焰是激发气体或等离子体。

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