...
首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >SEMI-EMPIRICAL STUDIES ON ELECTRONIC STRUCTURES OF A BORON-DOPED GRAPHENE LAYER - IMPLICATIONS ON THE OXIDATION MECHANISM
【24h】

SEMI-EMPIRICAL STUDIES ON ELECTRONIC STRUCTURES OF A BORON-DOPED GRAPHENE LAYER - IMPLICATIONS ON THE OXIDATION MECHANISM

机译:掺硼石墨烯层电子结构的半实证研究-对氧化机理的影响

获取原文
获取原文并翻译 | 示例

摘要

The electronic structures of pure and boron-doped graphene layers have been investigated using the semi-empirical Molecular Orbital Package (MOPAC) and large clusters of carbon atoms. It is shown that boron-doping on the edge and internal lattice sites of the graphene layer produces very different effects on the electronic structure around the edges. It is found that the substitutional boron atoms on the edges dramatically alter the density distribution of high energy electrons along the edges and the substitutional boron atoms in the deep internal lattice sites do not produce any significant effect on the density distribution along the edges. Based on the results obtained, a model is proposed for describing the oxidation process in boron-doped graphite. The mechanism of oxidation inhibition due to boron-doping of a graphene layer is chemical inhibition via the reduction of electron density with high energy at surface sites, and consequently, a reduction in the total number of active sites for gasification of the carbon. (C) 1997 Elsevier Science Ltd. [References: 20]
机译:已使用半经验分子轨道包装(MOPAC)和大碳原子簇研究了纯硼掺杂石墨烯层的电子结构。结果表明,石墨烯层的边缘和内部晶格位上的硼掺杂对边缘周围的电子结构产生非常不同的影响。发现边缘上的取代硼原子极大地改变了沿边缘的高能电子的密度分布,并且深内部晶格位点中的取代硼原子对沿边缘的密度分布没有任何显着影响。基于获得的结果,提出了用于描述掺硼石墨中氧化过程的模型。由于石墨烯层的硼掺杂而引起的氧化抑制的机理是化学抑制,其通过降低表面位置处具有高能量的电子密度,因此减少了用于气化碳的活性位置的总数。 (C)1997 Elsevier Science Ltd. [参考:20]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号