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Investigation of adhesive and frictional behavior of GeSbTe films with AFM/FFM

机译:用AFM / FFM研究GeSbTe薄膜的粘附和摩擦行为

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Frictional force microscope (FFM) was used to investigate the nanoscale frictional behavior of GeSbTe films deposited by magnetron sputtering. The effects of relative humidity, scanning velocity and surface roughness on friction were taken into account. Besides, the frictional behavior of GeSbTe films with different compositions was analyzed. Experimental results show that the coefficient of friction of GeSbTe films is almost independent of scanning velocity, while the frictional force decreases with increasing velocity. Both the relationship of friction vs. normal load and that of friction vs. RMS keep relatively linear, and the coefficient of friction increases with the increase in RMS. The influence of humidity on adhesion between the tip and the GeSb{sub}2Te{sub}4 film is more significant than that between the tip and the Ge{sub}2Sb{sub}2Te{sub}5 film.
机译:摩擦力显微镜(FFM)用于研究磁控溅射沉积的GeSbTe薄膜的纳米级摩擦行为。考虑了相对湿度,扫描速度和表面粗糙度对摩擦的影响。此外,分析了不同组成的GeSbTe薄膜的摩擦行为。实验结果表明,GeSbTe薄膜的摩擦系数几乎与扫描速度无关,而摩擦力随速度的增加而减小。摩擦与正常负载的关系以及摩擦与RMS的关系都保持相对线性,并且摩擦系数随RMS的增加而增加。湿度对尖端与GeSb {sub} 2Te {sub} 4薄膜之间粘附力的影响比尖端与Ge {sub} 2Sb {sub} 2Te {sub} 5薄膜之间粘附力的影响更大。

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