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High frequency magnetic properties of CoZrNb thin films deposited by dynamic sputtering technique for GHz Si-integrated planar inductors

机译:动态溅射技术沉积的GHz硅集成平面电感CoZrNb薄膜的高频磁性能

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摘要

Soft ferromagnetic zero-magnetostrictive CoNbZr thin films have been dynamically deposited by dc planar magnetron sputtering onto continuously transported substrates. No magnetic field has been applied to the films during deposition. The films reveal a well-defined in plane uniaxial anisotropy with an easy axis aligned along the direction of substrate motion. As a result, an anisotropy field of 75 Oe and a ferromagnetic resonance frequency of 2.6 GHz have been measured. The study of the relationship between magnetic properties and film thickness points out a critical thickness around 0.3 mu m, above which the films exhibit a stripe-domain-like behavior which is detrimental for the high frequency use. The thermal stability of the films is found to be usual as regular amorphous core materials (stable up to 300 deg C). Additionally, it is shown that the films do not suffer from rotatable magnetic anisotropy usually observed in conventional statically deposited films under magnetic field. Finally, a different origin of the magnetic anisotropy is suggested in dynamically deposited films.
机译:软铁磁零磁致伸缩CoNbZr薄膜已通过dc平面磁控管溅射法动态沉积到连续传输的基板上。在沉积过程中没有磁场施加到薄膜上。这些膜揭示了一个良好定义的平面单轴各向异性,其易轴沿基板运动方向对齐。结果,测量了75 Oe的各向异性场和2.6 GHz的铁磁共振频率。对磁性能和膜厚度之间关系的研究指出,临界厚度约为0.3微米,在该临界厚度以上,膜呈现出类似条纹区域的行为,这不利于高频使用。发现膜的热稳定性通常是常规的非晶核材料(稳定至300摄氏度)。另外,显示出膜不具有通常在磁场下在常规静态沉积膜中通常观察到的可旋转的磁各向异性。最后,在动态沉积的薄膜中提出了磁各向异性的不同起源。

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