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Multiphase films bearing Ti_2AlN by pulse plasma hollow cathode nitriding

机译:脉冲等离子体空心阴极氮化处理含Ti_2AlN的多相膜

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This study aims to resolve the wear resistance and extend the use of titanium aluminides. A novel method of obtaining multiphase films bearing Ti_2AIN on the Ti-AI alloys is put forward. The Ti_(1-x)Al_x (x=0-25, 0-33 and 0-47) alloys were nitrided in a pulse plasma hollow cathode environment at 800-900°C for various durations in a mixture of 50%N_2 and 50%H_2 under pressures of 1-50-3-00 torr. The results show that the nitriding gas pressure has a strong influence on the phase structure of the surface films. The forming phases in the films are mainly composed of Ti_2AIN and TiN compounds. The presence of Ti_2AIN in the wear tracks apparently reduces the friction coefficient of the samples. The hardened phase TiN in the film improves the wear resistance of the Ti—33AI alloy.
机译:这项研究旨在解决耐磨性并扩大铝化钛的使用范围。提出了一种在Ti-Al合金上获得含Ti_2AIN的多相膜的新方法。将Ti_(1-x)Al_x(x = 0-25、0-33和0-47)合金在脉冲等离子空心阴极环境中于800-900°C下以50%N_2和在1-50-3-00托的压力下为50%H_2。结果表明,氮化气压对表面膜的相结构影响很大。薄膜中的形成相主要由Ti_2AIN和TiN化合物组成。磨损道中存在Ti_2AIN明显降低了样品的摩擦系数。膜中的硬化相TiN改善了Ti-33AI合金的耐磨性。

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