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PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
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机译:使用空心阴极离子浸泡技术氮化PECVD涂层等离子体
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摘要
Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
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