首页>
外国专利>
PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
PLASMA NITRIDING WITH PECVD COATINGS USING HOLLOW CATHODE ION IMMERSION TECHNOLOGY
展开▼
机译:空心阴极离子浸没技术在PECVD涂层上进行等离子体氮化
展开▼
页面导航
摘要
著录项
相似文献
摘要
Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
展开▼