首页> 外国专利> Vacuum coating appts. for prodn. of metal carbide or nitride films - where a reaction gas is passed through a hollow cathode gun for heating vapour source

Vacuum coating appts. for prodn. of metal carbide or nitride films - where a reaction gas is passed through a hollow cathode gun for heating vapour source

机译:真空镀膜装置。用于产品金属碳化物或氮化物膜-反应气体通过空心阴极枪加热蒸汽源

摘要

Vacuum coating appts. for producing a coated film of metal carbide or nitride on a base plate, comprises a sealed chamber, maintained under high vacuum, a vapour source boat disposed spaced beneath a base plate in the chamber, and an electron beam gun of known hollow cathode type for heating the vapour source. The reaction gas, e.g., hydrocarbon, N2, etc., is introduced through the hollow cathode gun into the vacuum chamber so as to react with the metal vapour generated from the boat before it reaches the substrate. As the reaction gas passes through the gun, it also serves as a cathode protecting gas.
机译:真空镀膜装置。用于在基板上生产金属碳化物或氮化物的涂层膜的装置,包括保持在高真空下的密封腔室,布置在腔室内基板下方的蒸气源舟皿,以及已知的用于空心阴极类型的电子束枪加热蒸气源。反应气体,例如碳氢化合物,N 2等,通过空心阴极枪被引入真空室,以便与从舟皿中产生的金属蒸气在到达衬底之前发生反应。当反应气体通过喷枪时,它也用作阴极保护气体。

著录项

  • 公开/公告号FR2425479A1

    专利类型

  • 公开/公告日1979-12-07

    原文格式PDF

  • 申请/专利权人 NIHON SHINKU GIJUTSU KK;

    申请/专利号FR19780032354

  • 发明设计人 SOJI KOMIYA;

    申请日1978-11-16

  • 分类号C23C15/00;

  • 国家 FR

  • 入库时间 2022-08-22 17:22:54

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